Enhanced EUV Mask Imaging Using Fourier Ptychographic Microscopy
Presented at SPIE Optical and EUV Nanolithography XXXVIII, February 26, 2025.
Preprint manuscript and example datasets are available upon reasonable request. Contact: [email protected]
Run recon.py
with a selected configuration file from configs/recon/
:
- Choose a configuration file in
configs/recon/
. - Set the
config_name
parameter inrecon.py
to the target configuration file name.
Run recon_full.py
for a full-FOV reconstruction using automatically divided patches:
- Choose a configuration file in
configs/recon_full/
. - Set the
config_name
parameter inrecon_full.py
to the target configuration file name.
Check the plot_exp.ipynb
and torch_fp_recon.ipynb
and choose the configuration file accordingly.
Below are a few key parameters in the configuration files:
-
elliptical_pupil
:- Set to
True
for anamorphic 0.55/4× NA with 20% central obscuration and 1250× magnification. - Set to
False
for isomorphic 0.33/4× NA with 900× magnification.
- Set to
-
ROI_length
:- Defines the reconstruction patch size.
-
algorithm
:- Specifies the reconstruction algorithm. Choose from:
'GS'
– Gerchberg-Saxton'GN'
– Gauss-Newton'EPFR'
– Embedded Pupil Function Recovery
- Specifies the reconstruction algorithm. Choose from:
Data collected at 13.5 nm wavelength EUV microscope.
(a) Details of three sample regions in the full FOV, showing one raw captured image and the corresponding reconstruction for each. The gray box in the bottom left corner marks the patch used for field-dependent aberration analysis in panel (b). The gray dots indicate the centers of the segmented regions, with the full FOV divided into a 6×6 grid with 20% overlap.
(b) Full-FOV aberration visualization, where the 6×6 grid layout presents the pupil wavefront reconstruction for each patch.